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Der Schottky-Effekt an reinen Silizium-Oberflächen
| Metadata Label | Value |
|---|---|
| Author(s): | Wullschleger, Jörg |
| Publisher: | Unknown |
| Citation: | Wullschleger, Jörg. Der Schottky-Effekt an reinen Silizium-Oberflächen. (1970). http://dx.doi.org/10.3929/ethz-a-000093415 |
| Document Type: | Doctoral and Habilitation Theses |
| Documents: |
Abstract
(116.21KB) |
Detailed Information
| Metadata | Description |
|---|---|
| Title | Der Schottky-Effekt an reinen Silizium-Oberflächen |
| Author(s) | Wullschleger, Jörg |
| Publication Place | Zürich |
| Publication Date | 1970 |
| Notes | Diss. Naturwiss. ETH Zürich, Nr. 4427, 0000. Ref.: Busch, G. ; Korref.: Baltensperger, W. |
| Language | German |
| DOI | http://dx.doi.org/10.3929/ethz-a-000093415 |
| Subject(s) | Telecommunications |
| Keyword(s) |
SHOT NOISE SILICON |
| Description | File Name | MIME Type | Size |
|---|---|---|---|
| Abstract |
eth-33311-01.pdf |
application/pdf | 116.21KB |
| Description | URL |
|---|---|
| NEBIS Link | http://opac.nebis.ch/F/?local_base=NEBIS&func=find-b&find_code=SYS&request=000093415 |
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| Views | 118 |  |
| Downloads | 102 |  |
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E-Collection record created: Wed, 18 Feb 2009, 06:22:38 CET