SiOx thin film deposition on particles by plasma enhanced chemical vapor deposition in a circulating fluidized bed reactor

Metadata Label Value
Author(s): Borer, Beat Urs
Publisher: ETH
Citation:

Borer, Beat Urs. SiOx thin film deposition on particles by plasma enhanced chemical vapor deposition in a circulating fluidized bed reactor. ETH (2005). http://dx.doi.org/10.3929/ethz-a-005142286

Document Type: Doctoral and Habilitation Theses  
Documents: Abstract (234.91KB) , Fulltext (8.27MB)
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Detailed Information

Metadata Description
Title SiOx thin film deposition on particles by plasma enhanced chemical vapor deposition in a circulating fluidized bed reactor
Author(s) Borer, Beat Urs
Publication Place Zürich
Publisher ETH
Publication Date 2005
Notes Diss., Technische Wissenschaften, Eidgenössische Technische Hochschule ETH Zürich, Nr. 16183, 2006
Language English
DOI http://dx.doi.org/10.3929/ethz-a-005142286
Subject(s) Technical Chemistry, Process Engineering
Keyword(s) PRODUCTION OF THIN FILMS
PHYSICS OF MOLECULAR SYSTEMS
CHEMICAL VAPOUR DEPOSITION
PRODUCTION ENGINEERING
SEPARATING
SORTING
SIFTING
SCREENING
MECHANICAL PROCESS ENGINEERING
MICROSTRUCTURE OF MOLECULAR SYSTEMS
PHYSICS
Description File Name MIME Type Size
Abstract   eth-28482-01.pdf application/pdf 234.91KB
Fulltext   eth-28482-02.pdf application/pdf 8.27MB
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E-Collection record created: Sat, 19 Apr 2008, 03:43:56 CET