PECVD of SiO₂-like thin films under continuous wave and pulsed modes

Metadata Label Value
Author(s): Harf-Bapin, Elisabeth Ines
Publisher: Unknown
Citation:

Harf-Bapin, Elisabeth Ines. PECVD of SiO₂-like thin films under continuous wave and pulsed modes. (2001). http://dx.doi.org/10.3929/ethz-a-004319846

Document Type: Doctoral and Habilitation Theses  
Documents: Abstract (273.47KB)

Detailed Information

Metadata Description
Title PECVD of SiO₂-like thin films under continuous wave and pulsed modes
Author(s) Harf-Bapin, Elisabeth Ines
Publication Place Zürich
Publication Date 2001
Notes Diss., Technische Wissenschaften ETH Zürich, Nr. 14355, 2002
Language English
DOI http://dx.doi.org/10.3929/ethz-a-004319846
Subject(s) Technical Chemistry, Process Engineering
Keyword(s) APPLIED PLASMA PHYSICS
THIN LAYER FORMATION BY VAPORIZATION AND CONDENSATION
PHYSICS OF MOLECULAR SYSTEMS
PROPERTIES OF THIN LAYERS
Description File Name MIME Type Size
Abstract   eth-25075-01.pdf application/pdf 273.47KB
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E-Collection record created: Fri, 18 Apr 2008, 23:46:12 CET