Aufbringung von Siliziumschichten durch Plasma-CVD und Anwendung auf Beschichtungen in einer Plasma-Wirbelschicht

Metadata Label Value
Author(s): Bayer, Christian
Publisher: VDI Verlag
Citation:

Bayer, Christian. Aufbringung von Siliziumschichten durch Plasma-CVD und Anwendung auf Beschichtungen in einer Plasma-Wirbelschicht. VDI Verlag (1998). http://dx.doi.org/10.3929/ethz-a-001915475

Document Type: Doctoral and Habilitation Theses  
Documents: Abstract (19.15KB) , Fulltext (13.66MB)
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Detailed Information

Metadata Description
Title Aufbringung von Siliziumschichten durch Plasma-CVD und Anwendung auf Beschichtungen in einer Plasma-Wirbelschicht
Author(s) Bayer, Christian
Publication Place Düsseldorf
Publisher VDI Verlag
Publication Date 1998
Notes Diss. Techn. Wiss. ETH Zürich, Nr. 12502, 1998. Ref.: Ph. Rudolf von Rohr ; Korref.: J. Engemann
Series Fortschritt-Berichte VDI. Reihe 3, Verfahrenstechnik Nr. 534
Language German
DOI http://dx.doi.org/10.3929/ethz-a-001915475
ISBN 3-18-353403-7
Subject(s) Mechanical Engineering, General
Keyword(s) APPLIED PLASMA PHYSICS
CHEMICAL VAPOUR DEPOSITION
SILICON OXIDES
THIN LAYER FORMATION BY VAPORIZATION AND CONDENSATION
Description File Name MIME Type Size
Abstract   eth-22578-01.pdf application/pdf 19.15KB
Fulltext   eth-22578-02.pdf application/pdf 13.66MB
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E-Collection record created: Fri, 18 Apr 2008, 20:59:54 CET